埃德万斯：高端非硅微纳机电技术的专家

半导体制造

柔性基底上微纳米镀膜制造工艺代表着当今高端制造的水平， 北京埃德万斯（Advancedmems）离子束技术研究所股份有限公司自主研发的离子束刻蚀机、离子束溅射镀膜机正是非硅微纳机电制造的核心设备。埃德万斯总经理高云龙强调，我们所拥有的是以上百台装机规模为基础的“离子束综合应用体系综合解决方案开放平台”。

埃德万斯上世纪80年代在中国离子束科技导师和技术应用领军人物刘金声带领下，自主研发了国内首台商用成套离子束刻蚀机、离子束溅射镀膜机，并在此基础上树立起自主可控的离子束应用工艺技术系统。多年来，埃德万斯一直低调服务于国内航空、航天、兵器等军工领域，伴随“中国制造2025”战略的发布实施，开始从军工走向民用市场。

Advanced开发的第四代离子束刻蚀系统、国际流行的CAIBE系统、双离子束薄膜制造与改性系统，以及近年开发出的三离子束合成薄膜系统和国际首创微机控制快速变深度刻蚀系统，是具备国际商售水平的实用型成套设备，拥有独立自主的知识产权，一直是受广大用户高度认可的国内的主流产品，长期占据国内市场70%以上的份额。

埃德万斯正在构建的非硅产业工艺研发集群是其独有优势和潜在价值所在。埃德万斯跨界创新驱动平台的战略，是在充分吸收和借鉴德国“工业4.0”的联合模式基础上设计的，可概括为“1+1+1”：一个发展高附加值制造业的科技创新联盟，一个非硅MEMS创新实验基地，一个打造后工业时代示范工厂。高云龙称，在整合基础上，将这一平台与产业对接，形成一个产、学、研、用并联的技术研发集群，更好地适应未来智能制造引发的生产模式和产业形态。

通过推动非硅芯片、非硅MEMS产业发展，为中国高端制造业进步、转型提供技术、工艺、设备支持，是埃德万斯依据自身技术和开发优势试图打造面向中国高端制造、具有自主知识产权的微纳米产业线上及线下开放平台的着力点。2016年，埃德万斯在其牵头起草的国内首个“关于中国构架非硅MEMS发展战略报告”中建议：“布局智能制造，要关注微纳米制造领域中MEMS整体发展，对非硅MEMS作适度加法，对MEMS作适度减法。”

高云龙表示，拥有着先进离子束加工技术以及丰富工艺开发转化经验的埃德万斯，将秉承科技报国精神，坚守一贯的创新理念，充分发挥自身各项优势，与业界共享技术成果、共同开拓离子束技术应用新天地。

ADVANCED: An Expert in High-end Non Silicon Micro Electro Mechanical Technology

Flexible substrate micro nano coating manufacturing technology represents the high-end manufacturing level, Beijing Ed Vance (Advancedmems) ion beam etching, ion beam sputtering machine ion beam Technology Research Institute of Limited by Share Ltd is the independent research and development of non silicon micro nano core mechanical and electrical equipment manufacturing. Advanced general manager Gao Yunlong stressed that what we have is the basis of "ion beam integrated application system integrated solutions more than 100 open platform installed capacity".

Ed Vance on 80s in China century science and technology and application of ion beam mentor leader under the leadership of Liu Jinsheng, developed the first domestic commercial complete sets of ion beam etching, ion beam sputtering machine, set up the application of ion beam technology system and on the basis of self-control. Over the years, has been low-key service in the domestic advanced aerospace, weapons and other military fields, with "2025 Chinese manufacturing" strategy implementation of release, starting from the military to civilian market.

Advanced development of the fourth generation of ion beam etching system, the international popular CAIBE system, dual ion beam film fabrication and modification of the system, as well as three in recent years to develop the ion beam synthesis film system and the first international deep etching system fast variable microcomputer control, practical equipment with the international commercial level, with independent intellectual property rights that is highly recognized by the majority of users of domestic mainstream products, long-term occupy the domestic market share of more than 70%.

Ed Vance is building non silicon industry process R & D cluster is its unique advantages and potential value. Drive platform strategy is in advanced cross-border innovation, fully absorb and learn from the design of the German industrial 4 combined on the basis of the model, can be summarized as "1+1+1": a development of high value-added manufacturing technology innovation alliance, a non silicon MEMS innovation experiment base, build a demonstration plant in post industrial era. Gao Yunlong said that in the integration on the basis of the docking of the platform and the industry, formed a production, learning and research, technology research and development of parallel cluster, better adapt to the future of intelligent manufacturing caused by the production mode and the form of industry.

Through the promotion of non silicon and non silicon MEMS industry development, progress and transformation process, provide technical and equipment support for China high-end manufacturing, is the focal point on the basis of their advanced technology and development advantages of trying to build Chinese oriented high-end manufacturing, with independent intellectual property rights of the micro nano industry online and offline open platform. In 2016, the advanced led the drafting of China's first "on the China framework of non reporting" development strategy of silicon MEMS suggested: "the layout of intelligent manufacturing, to focus on MEMS micro nano manufacturing overall development, make appropriate additions to non silicon MEMS, make appropriate subtraction of MEMS."

Gao Yunlong said, with advanced ion beam processing technology and rich experience in the development process of transformation advanced, will uphold the spirit of science and technology to serve the country, adhere to the concept of innovation consistent, give full play to their various advantages, sharing technological achievements, the co-development of new technology and industry application of ion beam.